Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII

Xehetasun bibliografikoak
Beste egile batzuk: Yoshioka, Nobuyuki
Formatua: Baliabide elektronikoa eBook
Hizkuntza:ingelesa
Argitaratua: SPIE Digital Library, 7/9/15
Gaiak:
Sarrera elektronikoa:Full text available on Research4Life (SPIE Digital Library)
Deskribapena
Alearen deskribapena:<strong>On-Campus Access Only (IP based access)</strong>
Deskribapen fisikoa:1 online resource
Formatua:Mode of access: Internet
ISBN:9781628418712
Sartu:Electronic access restricted to authorized AUW faculty, staff and students