Optical and EUV Lithography: A Modeling Perspective

Xehetasun bibliografikoak
Egile nagusia: Erdmann, Andreas
Formatua: Baliabide elektronikoa eBook
Hizkuntza:ingelesa
Argitaratua: SPIE Digital Library, 1/1/21
Gaiak:
Sarrera elektronikoa:Full text available on Research4Life (SPIE Digital Library)
Deskribapena
Alearen deskribapena:<strong>On-Campus Access Only (IP based access)</strong>
Deskribapen fisikoa:1 online resource
Formatua:Mode of access: Internet
ISBN:9781510639010
9781510639027
Sartu:Electronic access restricted to authorized AUW faculty, staff and students