APA引文

Ando, A. Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.

Chicago Style (17th ed.) Citation

Ando, Akihiko. Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.

MLA引文

Ando, Akihiko. Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.

警告：這些引文格式不一定是100％准確.