Takehisa, K. Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.
Cita Chicago (17th ed.)Takehisa, Kiwamu. Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.
Cita MLA (9th ed.)Takehisa, Kiwamu. Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology. SPIE Digital Library.
Atenció: Aquestes cites poden no estar 100% correctes.