Photomask and Next-Generation Lithography Mask Technology XIII

Detalles Bibliográficos
Outros autores: Houga, Morihisa
Formato: Electrónico eBook
Idioma:inglés
Publicado: SPIE Digital Library, 5/3/06
Subjects:
Acceso en liña:Full text available on Research4Life (SPIE Digital Library)
Descripción
descrición da copia:<strong>On-Campus Access Only (IP based access)</strong>
Descrición Física:1 online resource
Formato:Mode of access: Internet
ISBN:9780819463586
Acceso:Electronic access restricted to authorized AUW faculty, staff and students