Photomask and Next-Generation Lithography Mask Technology XV

Bibliografske podrobnosti
Drugi avtorji: Horiuchi, Toshiyuki
Format: Elektronski eKnjiga
Jezik:angleščina
Izdano: SPIE Digital Library, 6/9/08
Teme:
Online dostop:Full text available on Research4Life (SPIE Digital Library)
Opis
Opis knjige/članka:<strong>On-Campus Access Only (IP based access)</strong>
Fizični opis:1 online resource
Format:Mode of access: Internet
ISBN:9780819472434
Dostop:Electronic access restricted to authorized AUW faculty, staff and students