Advanced Processes for 193-nm Immersion Lithography

Xehetasun bibliografikoak
Egile nagusia: Wei, Yayi
Formatua: Baliabide elektronikoa eBook
Hizkuntza:ingelesa
Argitaratua: SPIE Digital Library, 1/1/09
Gaiak:
Sarrera elektronikoa:Full text available on Research4Life (SPIE Digital Library)
Deskribapena
Alearen deskribapena:<strong>On-Campus Access Only (IP based access)</strong>
Deskribapen fisikoa:1 online resource
Formatua:Mode of access: Internet
ISBN:9780819475572
9780819478436
Sartu:Electronic access restricted to authorized AUW faculty, staff and students